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Atmospheric pressure cold plasma

Plasma Jet — cold plasma precision, ready for the line and for the lab

A compact cold plasma unit, generated by double dielectric barrier discharge and driven by a DF3 dual-frequency controller. In-line, automatable and scientifically demanding.

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Plasma Jet, an atmospheric pressure cold plasma unit

In-line · 10–50 W · Rich in reactive species · Automatable via RS232 / Ethernet

Our plasma jet

Plasma technology built for rigour

The Plasma Jet is a peripheral atmospheric pressure cold plasma unit designed for the test bench. Ignition takes place in a double dielectric barrier configuration, then the jet is sustained by radio frequency — for a plasma that stays cold, yet dense in reactive species.

Double dielectric barrier

DDBD ignition sustained by RF at 10–50 W: a cold plasma, safe for sensitive substrates.

Millimetric footprint

Around 1 cm² of plasma footprint and a 2 to 10 mm effective working distance, for localised and repeatable treatment.

Tailored gas chemistry

Argon (4–10 slm), air/nitrogen for cooling (8–20 slm), and a choice of process gas to match the target chemistry.

DF3 controller

7" touchscreen, 20 kHz ignition, class-E sustain at 27.12 MHz, RS232 and Ethernet ports for remote control.

Specifications

≈ 1 cm²
Plasma jet footprint
2–10 mm
Effective working distance
10–50 W
RF power consumption
20 kHz + 27.12 MHz
HV ignition / class-E sustain
Ar, 4–10 slm
Working gas
Air / N₂, 8–20 slm
Cooling gas
Ar, Ar/H₂, Ar/O₂, N₂
Available process gases
RS232 + Ethernet
Local and remote control (VNC / TCP-IP)
Plasma Jet integrated into a production line
Production line

Integration without friction

Designed as a bench unit, the Plasma Jet slots straight into an existing production cell — no vacuum chamber, no pump-down cycle, no line reconfiguration.

  • Dedicated RS232 and Ethernet for automation and remote control (VNC / TCP-IP)
  • Compact footprint, compatible with a robot arm or a fixed in-line station
  • Parameters storable from the DF3 interface, for a repeatable throughput
  • Continuous treatment before bonding, printing, varnishing or functional deposition
Discuss an in-line integration
Plasma Jet used in a research laboratory
Research laboratory

Scientific rigour, total flexibility

Every trial has to be reproducible, every parameter traceable. The Plasma Jet gives access to four process gas chemistries, to explore the full spectrum of surface activation, functionalisation and etching.

  • 7" DF3 touchscreen: fine adjustment and real-time monitoring of gases and power
  • Millimetric treatment footprint, suited to small-area samples
  • Remote control over VNC or TCP-IP for integration into an automated protocol
  • A single platform for your scenarios in materials science, surface chemistry and nanotechnology
Talk to an applications specialist

Next-generation cold plasma, ready for your process.

Automated production cell or laboratory test bench: our technical team helps you size your Plasma Jet for your application.

Contact our technical team
Frequently asked questions

Before you write to us

Answers to the questions that come up most often about the Plasma Jet. If yours is not listed, write to us.

How does the Plasma Jet differ from a vacuum plasma?
The Plasma Jet works at atmospheric pressure: no vacuum chamber, no pump-down cycle. The plasma is generated straight onto the part, a few millimetres away, which allows targeted, fast treatment that can run continuously in line.
Can the Plasma Jet be automated on an existing line?
Yes. The DF3 controller has an RS232 port for activation and control, plus an Ethernet port for remote operation over VNC or TCP-IP, which makes it straightforward to integrate into a robotic cell or an automated line.
Which gases can be used with the Plasma Jet?
Argon is the working gas (4–10 slm) and air or nitrogen the cooling gas (8–20 slm). For the process gas, you can choose between argon, argon/hydrogen, argon/oxygen or nitrogen, depending on the surface chemistry you are after.
Is the Plasma Jet suitable for use in a research laboratory?
Absolutely. Its millimetric treatment footprint, DF3 touchscreen interface and four process gas chemistries make it a precise tool for R&D in materials science, surface chemistry and nanotechnology.
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